Difference between revisions of "Laser Mask Generator"
Jump to navigation
Jump to search
Cmditradmin (talk | contribs) m (Created page with '<table id="toc" style="width: 100%"> <tr> <td style="text-align: center; width: 33%">Return to Research Tool Menu</td> <…') |
Cmditradmin (talk | contribs) m (→Overview) |
||
| Line 7: | Line 7: | ||
=== Overview === | === Overview === | ||
The Laser Mask Generator is system for producing photolithography masks for etching substrates with features down to | The Laser Mask Generator is system for producing photolithography masks for etching substrates with features down to 3μm. The laser exposes a photo mask that has been spun coated on a substrate such as silicon. The mask is then developed and the remaining material is used for etching or for etching or further deposition steps. The mask generator is useful for rapid fabrication of prototype electronic devices, micromechanical devices and hybrid devices. | ||
=== Significance === | === Significance === | ||
Revision as of 09:22, 8 August 2011
| Return to Research Tool Menu |
Overview
The Laser Mask Generator is system for producing photolithography masks for etching substrates with features down to 3μm. The laser exposes a photo mask that has been spun coated on a substrate such as silicon. The mask is then developed and the remaining material is used for etching or for etching or further deposition steps. The mask generator is useful for rapid fabrication of prototype electronic devices, micromechanical devices and hybrid devices.