Difference between revisions of "Laser Mask Generator"
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<td style="text-align: center; width: 33%">[[Main_Page# | <td style="text-align: center; width: 33%">[[Main_Page#Synthesis_and_Fabrication|Return to Research Tool Menu]]</td> | ||
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=== Significance === | === Significance === | ||
This animation shows the steps in using a positive photoresist. The exposed portions wash away after development. In a negative photoresist such as SU-8 the exposed portions remain while the unexposed areas are washed away. | |||
<swf width="400" height="331">images/3/3d/Maskwriter.swf</swf> | |||
=== Operation === | |||
{{#ev:youtube|emug1a4OlS8}} | |||
=== | |||
=== External Links === | === External Links === | ||
Latest revision as of 10:43, 11 October 2011
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Overview
The Laser Mask Generator is system for producing photolithography masks for etching substrates with features down to 3μm. The laser exposes a photo mask that has been spun coated on a substrate such as silicon. The mask is then developed and the remaining material is used for etching or for etching or further deposition steps. The mask generator is useful for rapid fabrication of prototype electronic devices, micromechanical devices and hybrid devices.
Significance
This animation shows the steps in using a positive photoresist. The exposed portions wash away after development. In a negative photoresist such as SU-8 the exposed portions remain while the unexposed areas are washed away. <swf width="400" height="331">images/3/3d/Maskwriter.swf</swf>